Company Filing History:
Years Active: 2004
Title: The Innovations of David A. Ziemer
Introduction
David A. Ziemer is an accomplished inventor based in Essex Junction, Vermont. He is known for his significant contributions to the field of lithography, particularly in the area of process tool overlay settings. With one patent to his name, Ziemer has made a notable impact in his industry.
Latest Patents
Ziemer's patent, titled "Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settings," presents a system and method for monitoring and predicting tool overlay settings. This innovative method involves generating current lot information and historical data, categorizing the historical data into discrete exposure field size ranges, and predicting current lot tool overlay settings based on this information. The method effectively monitors overlay errors during each lot's pass through lithographic process operations. Additionally, it employs a feedback sorting criteria to ensure accurate tool overlay settings. The current lot information includes lithographic field dimensions, with distortion data derived from the current lithographic process tool. Historical data consists of same-bin lithographic field size dimensions from previous lots, statistically indicating that the data is derived from similar lots processed on the same tool.
Career Highlights
David A. Ziemer is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in lithographic technology. His work has been instrumental in enhancing the efficiency and accuracy of lithographic processes.
Collaborations
Ziemer has collaborated with notable colleagues, including Edward W. Conrad and John S. Smyth. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
David A. Ziemer's contributions to the field of lithography through his innovative patent and work at IBM highlight his role as a significant inventor. His advancements in predicting process tool overlay settings demonstrate the importance of innovation in technology.