David A Petermann

Title: Innovations by David A. Petermann

Introduction

David A. Petermann is an accomplished inventor based in Elgin, TX (US). He has made significant contributions to the field of multi-pattern lithography, holding 2 patents that address complex challenges in circuit design.

Latest Patents

One of his latest patents is titled "Method of resolving color conflicts for cell-based designs with multi-pattern lithography." This method involves receiving a data file containing placement data for various circuit cells, which include layout portions associated with multiple lithographic colors. The process determines if a violating circuit cell needs to be re-colored and indicates this through a shape on a color swap layer in the data file. This innovation allows a mask generator to re-color the specified portion of the violating circuit cell.

Another notable patent is "Method of resolving multi-patterned color conflicts for multi-row logic cells." This method divides circuit cells into colorable sub-portions and assesses whether a violating colorable sub-portion requires re-coloring. It also indicates the need for partial re-coloring, enhancing the efficiency of circuit design.

Career Highlights

David A. Petermann is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of circuit design and lithography. His work has been instrumental in advancing technologies that improve the performance and reliability of electronic devices.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Andrew Paul Hoover and Chandrakanth Ramesh. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

David A. Petermann's contributions to the field of multi-pattern lithography and circuit design demonstrate his commitment to innovation. His patents reflect a deep understanding of complex engineering challenges and a dedication to improving electronic design processes.