Greenville, SC, United States of America

David A MacEwen


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: David A. MacEwen: Innovator in Stain Resistant Compositions

Introduction

David A. MacEwen is a notable inventor based in Greenville, SC (US). He has made significant contributions to the field of materials science, particularly in the development of stain-resistant compositions for polyamide substrates.

Latest Patents

David A. MacEwen holds a patent for a "Stain resistant composition for polyamide containing substrates." This innovative composition is designed to treat polyamide materials, such as nylon carpeting. The stain blocking composition includes one or more novolak resins combined with an addition polymer and a metal donor, such as a magnesium salt. The addition polymer is specifically directed to a partially sulfonated styrene-maleic copolymer. This polymer not only acts as a stain blocking agent but also mitigates the yellowing effect that sulfonated novolak resins may have on polyamide substrates. Additionally, the composition can incorporate various other ingredients, such as emulsifiers, dispersants, antioxidants like sodium thiocyanate, or fluorocarbon repellents.

Career Highlights

David A. MacEwen is associated with Sybron Chemicals, Inc., where he has applied his expertise in developing innovative chemical solutions. His work has significantly impacted the industry, particularly in enhancing the durability and appearance of polyamide materials.

Collaborations

Throughout his career, David has collaborated with notable colleagues, including Jim Konzelman and Robert B. Login. These partnerships have fostered a creative environment that has led to advancements in their respective fields.

Conclusion

David A. MacEwen's contributions to the development of stain-resistant compositions highlight his innovative spirit and dedication to improving material performance. His work continues to influence the industry and pave the way for future advancements in chemical applications.

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