Dave Stanasolovich

Title: Innovations by Dave Stanasolovich

Introduction

Dave Stanasolovich is an accomplished inventor based in Ithaca, NY (US). He is known for his significant contributions to the field of semiconductor fabrication. His innovative methods have paved the way for advancements in high circuit density technologies.

Latest Patents

Stanasolovich holds a patent for a "Method for fabricating high circuit density, self-aligned metal lines." This method involves the fabrication of patterned conductive lines that are self-aligned with underlying contact windows. The process utilizes a layer of photosensitive material, such as photoresist, which is formed over a dielectric layer. The method includes several reactive ion etch (RIE) steps to achieve the desired structure, ensuring high efficiency and reduced interlevel shorts.

Career Highlights

Stanasolovich has made notable contributions while working at the International Business Machines Corporation (IBM). His work has been instrumental in enhancing the performance and reliability of semiconductor devices. With a focus on innovative fabrication techniques, he has established himself as a key figure in the industry.

Collaborations

Throughout his career, Stanasolovich has collaborated with esteemed colleagues, including Harish N Kotecha and Hans A Protschka. These collaborations have further enriched his work and contributed to the development of advanced technologies in semiconductor fabrication.

Conclusion

Dave Stanasolovich's innovative methods and contributions to semiconductor technology highlight his role as a leading inventor in the field. His patent for self-aligned metal lines exemplifies his commitment to advancing fabrication techniques.