Dave Monahan

Title: The Innovative Journey of Dave Monahan

Introduction

Dave Monahan, an esteemed inventor, is known for his contributions to the field of integrated circuits in Palo Alto, California. His innovation in plasma etching techniques has paved the way for advancements in refractory metals and silicides.

Latest Patents

Monahan holds a patent for "Plasma etching of refractory metals and their silicides." This groundbreaking patent focuses on the use of carbonyl chemistry for etching refractory metals, refractory metal silicides, and polysilicon/refractory metal silicide sandwich structures in integrated circuits. The technique involves the utilization of a plasma etch process that incorporates an etchant gas mixture containing carbon dioxide (CO2), which can dissociate to form carbonyl groups (CO) or carbonyl halide radicals in combination with halogen sources.

Career Highlights

Currently employed at Texas Instruments Corporation, Dave Monahan has distinguished himself through his innovative work and dedication to technological advancement. His single patent exemplifies his expertise and commitment to enhancing the capabilities of integrated circuits.

Collaborations

Throughout his career, Monahan has worked alongside notable colleagues, including Clyde R. Fuller and Gordon P. Pollack. Their collaborative efforts have contributed to the development of pioneering technologies in the industry.

Conclusion

Dave Monahan's inventive spirit and technical contributions, particularly in the realm of plasma etching, have solidified his position as a key figure in the field of integrated circuit technology. His work continues to influence advancements in semiconductor manufacturing and materials science.