Company Filing History:
Years Active: 2004
Title: The Innovative Contributions of Darryl Bennett
Introduction
Darryl Bennett is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of semiconductor cleaning technology. His work focuses on enhancing the efficiency of cleaning processes for various substrates used in advanced manufacturing.
Latest Patents
Darryl Bennett holds a patent for a method and apparatus titled "Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation." This innovative approach is designed for cleaning semiconductor wafers, next-generation lithography (NGL) masks, and optical photomasks. The method utilizes reactive gases and gas mixtures along with mechanical agitation to improve particle removal efficiency. By incorporating a reactive gas process into an inert gas feed, the plasma cleaning process is enhanced, effectively breaking chemical bonds between surface particles and substrates.
Career Highlights
Darryl Bennett is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His expertise in cleaning technologies has positioned him as a valuable asset within the organization. His innovative methods have the potential to significantly impact the efficiency of semiconductor manufacturing processes.
Collaborations
Darryl has collaborated with notable colleagues, including John J Festa and Joel Brad Bailey. Their combined expertise contributes to the advancement of technologies in the semiconductor field.
Conclusion
Darryl Bennett's contributions to semiconductor cleaning technology exemplify the importance of innovation in manufacturing processes. His patented methods enhance cleaning efficiency, paving the way for advancements in the semiconductor industry.