Danilo De Simone

Title: Danilo De Simone: Innovator in Lithography and Metrology

Introduction

Danilo De Simone is a prominent inventor based in Leuven, Belgium. He has made significant contributions to the fields of lithography and metrology, holding a total of 2 patents. His work focuses on advancing technologies that enhance the precision and efficiency of pattern production.

Latest Patents

One of his latest patents is titled "Pattern height metrology using an e-beam system." This invention relates to determining the height of patterns produced with extreme ultraviolet (EUV) lithography in a resist film. The method employs an electron beam (e-beam) system, specifically utilizing a scanning electron microscope (SEM). The device includes a processor that obtains SEM images and determines contrast values related to the pattern. Subsequently, it calculates the pattern height based on calibration data and the determined contrast value.

Another notable patent is the "Method for producing a pattern of features by lithography and etching." This method involves performing two exposure steps on a resist layer applied to a substrate, followed by a single etching step. The technique allows for the creation of denser arrays of holes or pillars by overlapping resist areas exposed in the two steps. By varying the mask patterns, different etched structure shapes can be produced, such as zig-zag patterns.

Career Highlights

Danilo De Simone has worked with esteemed organizations, including Imec and Katholieke Universiteit Leuven. His experience in these institutions has allowed him to collaborate on cutting-edge research and development projects in the field of nanotechnology and materials science.

Collaborations

Throughout his career, Danilo has collaborated with notable colleagues, including Gian Francesco Lorusso and Mohamed Saib. These partnerships have contributed to the advancement of innovative solutions in lithography and metrology.

Conclusion

Danilo De Simone is a distinguished inventor whose work in lithography and metrology has led to significant advancements in the field. His patents reflect a commitment to innovation and precision, making him a valuable contributor to technological progress.