Daniel V Raney

Title: Innovations by Daniel V Raney

Introduction

Daniel V Raney is an accomplished inventor based in Mission Viejo, California. He holds a total of four patents, showcasing his expertise in the field of plasma jet systems and chemical vapor deposition (CVD) technologies. His innovative contributions have significantly advanced the capabilities of these technologies.

Latest Patents

One of his latest patents is a plasma jet system that includes gas injectors and a stand-off ring. The design of the gas injectors features outlet holes that are flared to optimize the expansion angle of the injected jet, which helps to keep the holes free from entrained atomic hydrogen. The injectors are arranged in a counter-rotational manner to the swirl of the primary jet, resulting in a more uniform mixture of hydrocarbons and atomic hydrogen. The stand-off ring is designed to allow cooler gases to enter the nozzle, which decreases the overall temperature of the injectors and mitigates the risk of injector cracking. Additionally, the vents reduce shear, increasing jet velocity and deposition rates for coatings. Another notable patent is the gas injection disc assembly for CVD applications. This assembly includes an outer ring and a tubular modular insert that fits into the outer ring. The design allows for effective gas sealing and prevents undesirable gas leakage during the CVD process, while also enabling easy removal for cleaning or replacement.

Career Highlights

Daniel V Raney has made significant strides in his career, particularly through his work at Celestech, Inc. His innovative designs and patents have positioned him as a key figure in the development of advanced CVD technologies. His contributions have not only enhanced the efficiency of these systems but have also paved the way for future advancements in the field.

Collaborations

Throughout his career, Daniel has collaborated with notable colleagues, including Michael S Heuser and C B Shepard, Jr. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Daniel V Raney's contributions to the field of plasma jet systems and CVD technologies are noteworthy. His innovative patents and collaborative efforts have significantly impacted the industry, showcasing his dedication to advancing technology.