Company Filing History:
Years Active: 2003
Title: Innovations by Daniel T Mudd
Introduction
Daniel T Mudd is an accomplished inventor based in St. Charles, MO (US). He has made significant contributions to the field of fluid mass flow control, particularly in applications relevant to semiconductor manufacturing processes. His innovative approach has led to the development of a unique apparatus that addresses specific challenges in controlling low flow rates of fluids.
Latest Patents
Mudd holds a patent for a "Small internal volume fluid mass flow control apparatus." This invention comprises a first elongated flow tube connected to an inlet fitting and a capsule-like valve housing. Additionally, it features a second elongated tube connected to the inlet fitting and the valve housing, which includes a flow sensor. The valve housing is linked to a magnetostrictive actuator that plays a crucial role in controlling fluid flow. The apparatus allows for adjustments to full-scale flow ranges by inserting a tube or wire in the flow sensor tube to act as a flow restrictor. Mudd's patent is a testament to his innovative thinking and technical expertise.
Career Highlights
Daniel T Mudd is associated with Fugasity Corporation, where he applies his knowledge and skills to further advancements in fluid control technologies. His work at the company has positioned him as a key player in the development of solutions that enhance manufacturing processes in the semiconductor industry.
Conclusion
Daniel T Mudd's contributions to fluid mass flow control technology demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in the field, showcasing his ability to address complex challenges in semiconductor manufacturing.