Middlesex, United Kingdom

Daniel Shaya

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: The Innovations of Daniel Shaya

Introduction

Daniel Shaya is an accomplished inventor based in Middlesex, GB. He has made significant contributions to the field of technology, particularly in the area of application monitoring systems. With a total of two patents to his name, Shaya's work focuses on enhancing the efficiency and reliability of application processes.

Latest Patents

Shaya's latest patents include innovative systems and methods for non-intrusive monitoring of intra-process latency of applications. These systems measure first metric data associated with trade data at a specific time point after the trade data is output by a first process of an application. They also identify the trade data at a second time point after it is output by a second process, measuring second metric data associated with the trade data identified at that time. If the latency value exceeds a predetermined threshold, a latency alert is sent to a user computing device associated with the application. Notably, the monitoring process is independent of the application processes, ensuring that it does not interfere with the application's operations.

Career Highlights

Daniel Shaya is currently employed at Citigroup Technology, Inc., where he continues to develop innovative solutions that address complex technological challenges. His expertise in application monitoring has positioned him as a valuable asset within the company.

Collaborations

Shaya collaborates with talented professionals such as Mohsin Jaffar and Jeremy York, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Daniel Shaya's contributions to technology through his patents and work at Citigroup Technology, Inc. highlight his commitment to advancing application monitoring systems. His innovative approach continues to influence the field and improve application efficiency.

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