Company Filing History:
Years Active: 1994
Title: The Innovations of Daniel H. Rosenblatt
Introduction
Daniel H. Rosenblatt is a notable inventor based in Belmont, California. He has made significant contributions to the field of semiconductor fabrication, particularly in the area of Group III-V compounds. His innovative approach has led to advancements in high-frequency transistor technology.
Latest Patents
Rosenblatt holds a patent for a method of fabricating Group III-V compounds. This patent describes a solution of hydrogen peroxide, citric acid, and a salt of citric acid, such as potassium citrate, which selectively etches GaAs-containing Group III-V compounds. The etching process occurs in a specific pH range, allowing for the selective etching of materials like Al_y Ga_1-y As in the presence of Al_x Ga_1-x As. This method is particularly useful in the fabrication of high-frequency transistors, enhancing their saturated current and threshold voltage uniformity.
Career Highlights
Rosenblatt is associated with Watkins-Johnson Company, where he has applied his expertise in semiconductor technology. His work has contributed to the development of advanced electronic components that are essential in various high-tech applications.
Collaborations
Throughout his career, Rosenblatt has collaborated with notable colleagues, including Ronald David Remba and Paul E. Brunemeier. These collaborations have fostered innovation and have led to significant advancements in their respective fields.
Conclusion
Daniel H. Rosenblatt's contributions to the field of semiconductor fabrication exemplify the impact of innovative thinking in technology. His patent for the method of fabricating Group III-V compounds showcases his commitment to advancing electronic component technology.