Daniel G Deyo

Title: The Innovative Contributions of Daniel G Deyo

Introduction

Daniel G Deyo is a notable inventor based in West Hurley, NY (US). He has made significant contributions to the field of semiconductor processes, particularly through his innovative patent. His work focuses on optimizing endpoint determination in semiconductor manufacturing, which is crucial for enhancing the efficiency and accuracy of these processes.

Latest Patents

Daniel G Deyo holds a patent titled "Endpoint optimization for semiconductor processes." This patent describes a method where a camera captures reflected light from the surface of a wafer during processes that add or remove material, such as etching. The invention emphasizes optimizing the camera's sampling rate and the intensity of the light source to accurately determine the endpoint of the process. By characterizing light intensities reflected from the wafer, the system can adjust the light source to accommodate complex wafer patterns. Additionally, the camera sampling rates can be optimized by rotating the wafer view and converting sampled intensities to the frequency domain. This approach helps in generating a clean and repeatable trace for endpoint determination.

Career Highlights

Daniel G Deyo is associated with Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to contribute to advancements in semiconductor manufacturing technologies. His innovative approach to endpoint optimization has the potential to improve production efficiency and product quality in the semiconductor sector.

Collaborations

Daniel has collaborated with notable colleagues such as Avishay Vaxman and Qintao Zhang. These collaborations have likely fostered a creative environment that encourages innovation and the development of cutting-edge technologies in semiconductor processes.

Conclusion

Daniel G Deyo's contributions to semiconductor technology through his patent on endpoint optimization demonstrate his commitment to innovation in the field. His work not only enhances manufacturing processes but also sets a foundation for future advancements in semiconductor technology.