Daniel E Cox

Title: Innovator Spotlight: Daniel E. Cox

Introduction: Daniel E. Cox, a distinguished inventor based in Ossining, NY, has made significant contributions to the field of microelectronics. With two patents to his name, his work focuses on advanced fabrication techniques essential for producing innovative microelectronic structures.

Latest Patents: Daniel E. Cox’s latest patents include groundbreaking technologies that enhance the precision and efficiency of microelectronic device production. The first patent, titled "Bubble Device Fabrication," describes a single-level masking process that allows for the production of microelectronic structures, such as magnetic bubble domain devices, with very fine line widths. This subtractive dry process utilizes a thin, additively plated mask to achieve optimal lithographic resolution, eliminating the necessity for thick resist layers that can compromise clarity. The method includes a double-layer metallurgy of conductor and magnetically soft layers, and it enables the creation of devices with high aspect ratios and uniform thicknesses.

His second patent, "Modification of Etch Rates by Solid Masking Materials," introduces an innovative approach to etching various materials via a solid source of reactive species located near the substrate. In contrast to traditional etching techniques, this method employs an ion beam to interact with a solid mask, producing reactive gas species that etch the substrate material effectively. This technique proves particularly beneficial for actively etched metals and can optimize etch rates, thereby enhancing the overall outcomes of the etching process.

Career Highlights: Daniel is a pivotal member of the International Business Machines Corporation (IBM), where he applies his expertise in the development of cutting-edge microelectronic devices. His innovative approaches in device fabrication have not only garnered him patents but also positioned him as a leader in the competitive landscape of microelectronics.

Collaborations: Throughout his career, Daniel E. Cox has collaborated with esteemed colleagues, including Kie Y. Ahn and Susan M. Kane. These partnerships have catalyzed advancements in their respective fields and contributed to the ongoing evolution of microelectronic technologies.

Conclusion: Daniel E. Cox exemplifies the spirit of innovation and dedication within the realm of microelectronics. His patents reflect a commitment to pushing the boundaries of technology, and his collaborations with peers highlight the importance of teamwork in driving progress. As he continues his work at IBM, the impact of his inventions will likely resonate within the industry for years to come.