Danville, CA, United States of America

Daniel C Glover

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel C Glover. Retrieved from https://idiyas.com/inventor/daniel-c-glover

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 6.2

ph-index = 1


Company Filing History:


Years Active: 2024-2025

Loading Chart...
3 patents (USPTO):Explore Patents

Title: **Daniel C. Glover: Innovator in Substrate Processing Technology**

Introduction

Daniel C. Glover, an esteemed inventor based in Danville, California, has made significant contributions to the field of substrate processing with a total of two patented innovations. His work primarily focuses on enhancing the efficiency and effectiveness of substrate handling in various applications.

Latest Patents

Glover's latest patents showcase his expertise in developing advanced apparatuses for substrate processing. One of his notable inventions is an *Apparatus for Rotating Substrates*. This invention revolves around an innovative design that includes a levitatable rotor embedded with multiple magnets. The rotor is supported by gas bearings, allowing it to float and rotate smoothly, further optimized by a stator that generates a rotating magnetic field.

Another noteworthy patent is the *Selective Oxidation on Rapid Thermal Processing (RTP) Chamber with Active Steam Generation*. This patent details advancements in gas distribution modules capable of functioning within RTP systems. The invention comprises a robust mixer coupled with lines for carrier gas and liquid, which interact to create a vaporized mixture, facilitating efficient gas delivery to RTP chambers.

Career Highlights

Throughout his career, Glover has significantly impacted the industry through his work at Applied Materials, Inc. His role within such a prominent company emphasizes his expertise in technological innovations that contribute to the advancement of substrate processing techniques.

Collaborations

Daniel Glover has had the pleasure of collaborating with esteemed colleagues, including Chaitanya Anjaneyalu Prasad and Christopher Sean Olsen. Together, they have pushed the boundaries of technology, leading to the development of groundbreaking advancements in their field.

Conclusion

As an inventor, Daniel C. Glover continues to leave his mark on the world of substrate processing. His patented innovations not only improve functionality but also pave the way for future developments in the industry. Through his work, Glover exemplifies the spirit of innovation, reinforcing the importance of research and collaboration in pushing technological boundaries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…