Daniel A Koos

Title: The Innovations of Daniel A. Koos

Introduction

Daniel A. Koos is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative processes that enhance the fabrication of semiconductor interconnect structures.

Latest Patents

One of his latest patents describes an etching process for selectively etching exposed metal surfaces of a substrate. This process involves the oxidation of the exposed metal to form a metal oxide, which is subsequently removed from the substrate's surface. The oxidation can be achieved using solutions containing oxidizing agents such as peroxides or gases like oxygen or ozone. The produced metal oxide is then removed using suitable etching agents, such as glycine. The process allows for controlled oxidation and/or etching with reduced pitting, ultimately leading to the formation of a conductive capping layer over the recessed exposed metal regions through electroless deposition.

Career Highlights

Daniel A. Koos is currently employed at Novellus Systems Incorporated, where he continues to innovate in semiconductor technology. His expertise in etching processes has positioned him as a key figure in the development of advanced semiconductor manufacturing techniques.

Collaborations

Throughout his career, Daniel has collaborated with esteemed colleagues such as Steven T. Mayer and Heung L. Park. These collaborations have further enriched his work and contributed to the advancements in the semiconductor field.

Conclusion

Daniel A. Koos exemplifies the spirit of innovation in semiconductor technology through his patents and contributions. His work continues to influence the industry and pave the way for future advancements.