Company Filing History:
Years Active: 1991-1993
Title: The Innovations of Dane E Bailey
Introduction
Dane E Bailey is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to manufacturing processes.
Latest Patents
One of his latest patents is titled "Method for in-situ doping of deposited silicon." This method utilizes low temperatures of approximately 560°C, low pressures of around 300 mTorr, and a low phosphine to silane ratio of approximately 0.0008 to create phosphorus-doped silicon. The process is designed to be manufacturable in an automated LPCVD reactor, allowing for the deposition of relatively uniform, defect-free silicon films with low resistivity and good conformality. This method ensures high wafer throughput over large semiconductor wafer lots.
Another significant patent is the "Vertical LPCVD reactor." This invention describes a vertical low-pressure chemical vapor deposition reactor used to form deposition films on semiconductor wafers. The reactor features a reaction chamber with both top and bottom portions, where a furnace heats the chamber. Deposition gases are introduced into the chamber through heated gas tubes, improving the uniformity of the deposited films on the wafers.
Career Highlights
Dane E Bailey is currently employed at Texas Instruments Corporation, where he continues to innovate in the semiconductor industry. His work has contributed to advancements in manufacturing techniques that enhance the efficiency and quality of semiconductor production.
Collaborations
Dane collaborates with Thomas E Tang, a fellow innovator in the field. Their combined expertise fosters a creative environment that drives technological advancements.
Conclusion
Dane E Bailey's contributions to semiconductor technology through his patents and work at Texas Instruments Corporation highlight his role as a key innovator in the industry. His methods and inventions pave the way for improved manufacturing processes and enhanced semiconductor performance.