Company Filing History:
Years Active: 2002-2004
Title: The Innovative Mind of Dan Towery: Pioneering Advances in Semiconductor Processing
Introduction: Dan Towery, an accomplished inventor based in Santa Clara, California, has made significant contributions to the field of semiconductor processing. With a total of three patents to his name, his work primarily focuses on enhancing the efficiency and effectiveness of chemical mechanical planarization (CMP) techniques, especially for low dielectric constant materials.
Latest Patents: Towery's latest innovations include two pivotal patents that aim to improve the mechanical and chemical properties of polishing slurries used in semiconductor fabrication. The first patent, titled "Chemical Mechanical Planarization of Low Dielectric Constant Materials," introduces an apparatus and methodology designed to minimize damage to materials such as copper and aluminum. By reducing mechanical abrasion and increasing chemical polishing through specialized slurries, this invention significantly lowers the risk of surface scratches in semiconductor devices.
The second patent, "Oxidizing Polishing Slurries for Low Dielectric Constant Materials," presents a new slurry formulation that combines non-oxidizing particles with oxidizing agents. This multi-modal approach enhances the polishing process, making it suitable for high-precision applications beyond just CMP, further solidifying Towery's role as an innovator in the field.
Career Highlights: Towery holds his position at Honeywell International Inc., a global leader in industrial technology, where he applies his expertise in semiconductor processing. His focus on developing advanced materials and techniques has positioned him as an important figure within his organization and the semiconductor industry.
Collaborations: Throughout his career, Towery has collaborated with notable colleagues such as Fan Zhang and Feng Quan Liu. Working alongside these talented individuals, he has been part of a team that drives innovation and pushes the boundaries of what is possible in semiconductor technology.
Conclusion: Dan Towery's contributions to semiconductor processing through his patents reflect his dedication to innovation and excellence. His work, particularly in the area of chemical mechanical planarization, not only advances the capabilities of manufacturing processes but also underscores the importance of collaboration in driving forward technological solutions. As the industry evolves, Towery’s insights and inventions are sure to leave a lasting impact.