Dale M Crockatt

Title: Inventor Spotlight: Dale M. Crockatt

Introduction

Dale M. Crockatt, an accomplished inventor based in Somers, NY, has made significant contributions to the field of photoresists, particularly in the realm of deep ultraviolet (DUV) lithography. With a total of three patents to her name, she has developed innovative materials that enhance the capabilities of imaging technologies.

Latest Patents

Dale's most recent patents highlight her expertise in highly sensitive photoresist materials. The first patent, titled "Highly Sensitive Dry Developable Deep UV Photoresist," details the creation of resists that are not only highly sensitive but also exhibit strong absorption characteristics in deep ultraviolet and vacuum ultraviolet regions. This innovation utilizes a novolak resin protected by an acid labile group, complemented by a photoinitiator that generates a strong acid upon exposure to radiation. The result is the ability to create reactive ion etch resistant patterns through the reaction of exposed resists with organometallic compounds.

Her second patent, "Thermally Stable Photoresists with High Sensitivity," reveals a novel approach using polymeric materials that possess acid labile or photolabile groups attached to the polymer backbone. These materials are designed to withstand temperatures greater than 160 degrees Celsius while remaining soluble in common lithographic developers and strippers. Additionally, this invention introduces substituted polyvinyl benzoates that, despite their opacity below 280 nm, serve effectively as the top layer in a bilayer resist process, acting as a mask for deep UV exposure.

Career Highlights

Throughout her career, Dale has been affiliated with prominent organizations, including IBM, where she contributed to advancing photolithographic technologies. Her innovative work focuses on improving the efficiency and resilience of photoresist materials in high-temperature applications, positioning her as a key player in the industry.

Collaborations

Dale has collaborated with notable colleagues such as William R. Brunsvold and Willard E. Conley. These partnerships have allowed her to leverage shared expertise and insights, further enhancing her research and development efforts in the field of semiconductor manufacturing.

Conclusion

Dale M. Crockatt's contributions to the development of advanced photoresist materials demonstrate her dedication and innovation in the field. Her patented technologies not only reflect her scientific acumen but also her commitment to enhancing the capabilities of lithographic processes. As she continues to push the boundaries in this area, Dale remains a prominent figure among contemporary inventors, paving the way for future advancements in imaging technologies.