Location History:
- Kanagawa, JP (2018)
- Tokyo, JP (2020 - 2021)
Company Filing History:
Years Active: 2018-2021
Title: Daisuke Sadohara: Innovator in Circuit Formation Technology
Introduction
Daisuke Sadohara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of circuit formation technology, holding three patents that showcase his innovative approach to substrate processing.
Latest Patents
One of his latest patents is a method for forming a circuit on a substrate. This new method allows for metal plating on a desired portion of a substrate through a minimal number of steps, regardless of the substrate type. The process involves applying a coating film containing a silicone oligomer and a catalyst metal onto the substrate. Following this, an activation treatment of the catalyst metal is performed to enable autocatalytic properties, leading to successful electroless plating. Another notable patent is for a silicon oligomer and its production method. This invention aims to provide a silicon oligomer with a novel function that surpasses the capabilities of conventional condensation products of water and tetraalkoxysilane.
Career Highlights
Daisuke Sadohara has worked with notable companies such as JCU Corporation and Honda Motor Co., Ltd. His experience in these organizations has contributed to his expertise in the field of circuit technology.
Collaborations
Throughout his career, Daisuke has collaborated with esteemed colleagues, including Kenichi Nishikawa and Katsumi Shimoda. These partnerships have further enriched his work and innovations.
Conclusion
Daisuke Sadohara is a distinguished inventor whose work in circuit formation technology has led to groundbreaking patents. His innovative methods and collaborations continue to influence the industry and pave the way for future advancements.