Company Filing History:
Years Active: 2021
Title: Daisuke Murano: Innovator in Polyamide Fine Particles
Introduction
Daisuke Murano is a notable inventor based in Chuo-ku, Japan. He has made significant contributions to the field of materials science, particularly in the development of polyamide fine particles. His innovative work focuses on creating environmentally friendly materials with enhanced properties.
Latest Patents
Daisuke Murano holds a patent for a "Polyamide fine particle, method for producing same, and polyamide fine particle composition." This invention provides a spherical polyamide fine particle that exhibits smooth sliding properties and minimizes environmental pollution. The polyamide fine particle includes a structural unit with at least one alkylene group and at least one amide bond, where each alkylene group contains 1 to 5 carbon atoms. Notably, the polyamide fine particle achieves a sphericity of 80 or greater, enhancing its usability in various applications. He has 1 patent to his name.
Career Highlights
Daisuke Murano is associated with Kureha Corporation, where he applies his expertise in materials science to drive innovation. His work at Kureha Corporation has positioned him as a key player in the development of advanced materials.
Collaborations
Throughout his career, Daisuke has collaborated with talented individuals such as Kazuyuki Yamane and Yingge Xiao. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in their respective fields.
Conclusion
Daisuke Murano's contributions to the field of polyamide fine particles reflect his commitment to innovation and environmental sustainability. His work continues to influence the development of advanced materials that meet modern demands.