Chiryu, Japan

Daisuke Itomura

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Daisuke Itomura: Innovator in Plasma Technology

Introduction

Daisuke Itomura is a notable inventor based in Chiryu, Japan. He has made significant contributions to the field of plasma technology, particularly through his innovative designs and patents. His work is recognized for its potential applications in various industries.

Latest Patents

Daisuke Itomura holds a patent for a plasma generating apparatus. This apparatus includes a power supply with electrodes connected to the vacuum chamber walls of multiple vacuum chambers. It features an oscillator that outputs a pulse signal at predetermined intervals, along with pulse amplifying circuits that amplify the signal for each electrode in the vacuum chambers. Additionally, the design incorporates timing generating circuits that delay the pulse signal, ensuring that it is supplied to only one pulse amplifying circuit at any specific time. This innovative approach enhances the efficiency and effectiveness of plasma generation.

Career Highlights

Daisuke Itomura is currently employed at Denso Corporation, a leading company in the automotive industry. His role involves research and development in advanced technologies, where he applies his expertise in plasma systems to create innovative solutions. His contributions have been instrumental in advancing the company's technological capabilities.

Collaborations

Daisuke has collaborated with talented coworkers, including Ryonosuke Tera and Yasuaki Hirokawa. Together, they have worked on various projects that leverage their combined expertise in engineering and technology.

Conclusion

Daisuke Itomura is a prominent figure in the field of plasma technology, with a patent that showcases his innovative approach to engineering. His work at Denso Corporation and collaborations with skilled colleagues highlight his commitment to advancing technology. His contributions are paving the way for future innovations in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…