Dai-Sik Kim

Title: **Innovator Spotlight: Dai-Sik Kim**

Introduction

Dai-Sik Kim is an accomplished inventor based in Seoul, South Korea, known for his contributions to the field of surface plasmon optics. With one significant patent to his name, he continues to advance the frontiers of photolithography technology.

Latest Patents

Dai-Sik Kim holds a patent for "Surface plasmon optic devices and radiating surface plasmon sources for photolithography." This innovative device features a periodic array of apertures in a dielectric substrate along with a metal film formed on the substrate. The invention is designed to emit light from the metal-air interface, which enhances the efficiency of surface plasmons in various applications. Key components of this device include a surface plasmon generating apparatus, a surface plasmon detecting apparatus, and a surface plasmon controlling apparatus, among others. Notably, when a metal diffraction grating is applied to the metal film, it allows for the effective reflection, division, and control of propagating surface plasmons. Additionally, the radiating surface plasmon can be preserved at distances of at least a few microns, showcasing the device's practical utility in advanced optical technologies.

Career Highlights

Dai-Sik Kim is affiliated with the Seoul National University Industry Foundation, where he engages in research and development activities that focus on the application of surface plasmon devices. His academic and professional endeavors reflect a commitment to pushing the limits of current technologies and fostering innovation within the scientific community.

Collaborations

Throughout his career, Dai-Sik Kim has collaborated with esteemed colleagues such as Sung-Chul Hohng and Christoph Lienau. These partnerships exemplify the collaborative spirit essential in academia and research, facilitating the exchange of ideas and inspiration that leads to groundbreaking innovations.

Conclusion

Dai-Sik Kim is a dedicated inventor making strides in the realm of surface plasmon technology. His patent reflects significant advancements in photolithography, paving the way for future innovations in this critical area. With continued collaboration and research, Kim is poised to contribute further to the scientific community and enhance our understanding of optical devices.