Daejeon, South Korea

Dae Hwan Jung


 

Average Co-Inventor Count = 5.2

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2010-2012

Loading Chart...
Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations of Dae Hwan Jung

Introduction

Dae Hwan Jung is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of materials science and bioengineering. With a total of 3 patents, his work focuses on creating advanced surfaces and biochips that have practical applications in various industries.

Latest Patents

One of his latest patents is the "Preparation of super water repellent surface." This invention involves arranging multiple spherical beads on a substrate to create a super water-repellent surface. The process includes etching the substrate with the bead layer as a mask and applying a fluorine compound to form a hierarchical concavo-convex structure. Another notable patent is the "Method for fabricating a biochip using the high density carbon nanotube film or pattern." This biochip utilizes carbon nanotube films to create a platform for attaching bio-receptors, enabling the measurement of electrical signals without the need for labeling.

Career Highlights

Dae Hwan Jung has worked with esteemed institutions such as the Korea Advanced Institute of Science and Technology and the Korea Institute of Machinery & Materials. His experience in these organizations has allowed him to develop innovative technologies that bridge the gap between research and practical applications.

Collaborations

He has collaborated with notable colleagues, including Sang Yup Lee and Hee Tae Jung. Their combined expertise has contributed to the advancement of their respective fields and the successful development of innovative projects.

Conclusion

Dae Hwan Jung's contributions to innovation in materials science and bioengineering are noteworthy. His patents reflect a commitment to advancing technology for practical use. His work continues to inspire future developments in these fields.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…