Cuiyang Wang

Title: Innovations of Cuiyang Wang

Introduction

Cuiyang Wang is an accomplished inventor based in Andover, MA (US). He has made significant contributions to the field of semiconductor processing, particularly in the area of emission control. With a total of 3 patents, his work has garnered attention for its innovative approaches to reducing toxic emissions during the implantation process.

Latest Patents

One of Cuiyang Wang's latest patents focuses on phosphorus fugitive emission control. This patent discloses a method of processing and passivating an implanted workpiece, wherein the fugitive emissions are reduced to acceptably low levels after passivation. This method is particularly beneficial when toxic species such as phosphorus, arsine, or germane are used as dopants. The patent describes two embodiments: one involving a sputtering process performed after implantation to lower the dopant concentration at the surface, and another involving a chemical etching process. Following these processes, a traditional passivation can be performed to ensure safety and efficiency.

Career Highlights

Cuiyang Wang is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to develop and refine his innovative techniques, contributing to advancements in emission control technologies.

Collaborations

Cuiyang has collaborated with notable coworkers, including Jun Seok Lee and Il-Woong Koo. These collaborations have fostered a productive environment for innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

Cuiyang Wang's contributions to semiconductor processing and emission control highlight his role as a significant inventor in the industry. His innovative methods and collaborations continue to push the boundaries of technology, ensuring a safer and more efficient future in semiconductor manufacturing.