Hartmannsdorf, Germany

Cornelia A Weiss


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Cornelia A Weiss: Innovator in Depth Profile Metrology

Introduction

Cornelia A Weiss is a notable inventor based in Hartmannsdorf, Germany. She has made significant contributions to the field of metrology, particularly in the area of depth profiling using advanced X-ray fluorescence techniques. Her innovative work has implications for semiconductor manufacturing and materials science.

Latest Patents

Cornelia A Weiss holds a patent for "Depth profile metrology using grazing incidence X-ray fluorescence." This invention focuses on achieving excellent depth resolution by utilizing a primary incident X-ray beam at small angles near the critical angle. The method involves performing a series of X-ray fluorescence measurements at varying small angles to analyze the depth profiling of elements within a substrate. A key application of this technology is in the depth profiling of dopants used in semiconductor manufacturing, such as arsenic, phosphorus, and boron. The patent outlines a process where angles are varied from 0.01° to 0.20° to profile arsenic distribution within a semiconductor wafer. The measurements are acquired using a total reflection X-ray fluorescence (TXRF) type system, allowing for comparisons between known and unknown sample results.

Career Highlights

Cornelia A Weiss is associated with Advanced Micro Devices Corporation, where she applies her expertise in metrology and semiconductor technology. Her work has contributed to advancements in the precision and accuracy of depth profiling techniques, which are crucial for the development of modern electronic devices.

Collaborations

Some of her notable coworkers include Tim Z Hossain and Don A Tiffin, who have collaborated with her on various projects related to metrology and semiconductor research.

Conclusion

Cornelia A Weiss is a pioneering inventor whose work in depth profile metrology has advanced the field of semiconductor manufacturing. Her innovative techniques continue to influence the industry and enhance the understanding of material properties.

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