Mountain View, CA, United States of America

Collin K L Mui


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 374(Granted Patents)


Company Filing History:


Years Active: 2012-2015

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2 patents (USPTO):Explore Patents

Title: Collin K L Mui: Innovator in Semiconductor Technology

Introduction

Collin K L Mui is a prominent inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods and apparatuses that enhance the manufacturing processes of semiconductor substrates.

Latest Patents

Collin's latest patents include groundbreaking techniques for flowable oxide deposition. These methods involve the rapid delivery of process gases to fill gaps on partially manufactured semiconductor substrates with dielectric material. In certain embodiments, the process begins with the introduction of a first process gas into the processing chamber. A second process gas is accumulated in an accumulator, which is maintained at a pressure level significantly higher than that of the processing chamber. This second process gas is then rapidly introduced into the processing chamber, allowing for the formation of flowable silicon-containing films that effectively fill the gaps on the substrate surface.

Career Highlights

Collin K L Mui is associated with Novellus Systems Incorporated, a company known for its advanced semiconductor manufacturing technologies. His work at Novellus has positioned him as a key player in the development of innovative solutions for the semiconductor industry.

Collaborations

Collin has collaborated with notable coworkers, including Lakshminarayana Nittala and Nerissa Sue Draeger. Their combined expertise contributes to the advancement of semiconductor technologies and the successful implementation of innovative processes.

Conclusion

Collin K L Mui's contributions to semiconductor technology through his patents and work at Novellus Systems Incorporated highlight his role as an influential inventor in the field. His innovative methods for flowable oxide deposition are paving the way for advancements in semiconductor manufacturing.

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