Company Filing History:
Years Active: 1992-1993
Title: Innovations of Clifford A. King
Introduction
Clifford A. King is a notable inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device fabrication.
Latest Patents
One of his latest patents is focused on fabricating a semiconductor device with strained Si.sub.1-x Ge.sub.x. This invention involves a method of creating devices and circuits that utilize at least one heteroepitaxial layer under strain. The process includes growing a heteroepitaxial layer that exceeds the calculated equilibrium critical thickness for an uncapped layer on a crystalline substrate. Following the growth, the structure is processed at elevated temperatures, which helps in preventing misfit dislocations between layers. Another significant patent addresses semiconductor processing with a silicon cap over Si.sub.1-x Ge.sub.x film. This invention improves devices with silicon to SiGe alloy heterojunctions and utilizes advanced techniques such as X-ray topography and transmission electron microscopy to analyze misfit dislocations.
Career Highlights
Clifford A. King has had a distinguished career at Hewlett-Packard Company, where he has applied his expertise in semiconductor technology. His work has contributed to advancements in the field, particularly in the development of improved semiconductor devices.
Collaborations
Throughout his career, King has collaborated with notable colleagues, including Stephen Laderman and Martin P. Scott. These collaborations have further enhanced the impact of his inventions in the semiconductor industry.
Conclusion
Clifford A. King is a prominent inventor whose work in semiconductor technology has led to significant advancements in device fabrication. His innovative patents reflect his commitment to improving the efficiency and performance of semiconductor devices.