Plainwell, MI, United States of America

Churu Yun

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovative Journey of Churu Yun

Introduction

Churu Yun, an accomplished inventor based in Plainwell, MI, has made significant contributions to the field of surface cleaning technology. With a total of two patents under her name, she continues to push the boundaries of innovation within her industry.

Latest Patents

Yun's most recent patents focus on a cutting-edge surface cleaning apparatus equipped with an advanced illumination system. This innovative device not only cleans surfaces but also includes lighting features that illuminate the area being cleaned. The illumination system boasts multiple lights and lighting zones strategically placed around the apparatus's housing. It is designed to communicate with users by emitting visible light patterns that convey conditions, statuses, alerts, or errors. The flexibility of the lighting allows it to vary in intensity, color, wavelength, and temperature, enhancing user experience and operational efficiency.

Career Highlights

Yun works at Bissell Inc., a company renowned for its commitment to developing high-quality cleaning solutions. Her role in the organization has allowed her to translate her creative ideas into practical applications that benefit consumers and enhance cleaning technology.

Collaborations

Throughout her career, Churu has collaborated with notable colleagues such as Sang Hoon Chung and Mike Luyckx. These partnerships have fostered an environment of creativity and teamwork, allowing for the successful development and refinement of her patented inventions.

Conclusion

Churu Yun exemplifies the spirit of innovation, consistently striving to improve everyday products through her inventive ideas. Her contributions at Bissell Inc. and her patents reflect her dedication to enhancing the quality and effectiveness of surface cleaning technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…