Company Filing History:
Years Active: 2010
Title: Chunyun Xin: Innovator in CMOS Image Sensor Technology
Introduction
Chunyun Xin is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of CMOS image sensors. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this area.
Latest Patents
Chunyun Xin holds a patent for a "Method of making CMOS image sensor—hybrid silicide." This patent outlines techniques for manufacturing a CMOS image sensor. The process begins with providing a semiconductor substrate, where at least one isolation region is formed between the periphery region and the photo-sensing region of the substrate. The invention includes the formation of a first well in the periphery region and a second well in the photo-sensing region. Additionally, a third well associated with a photodiode is formed. The method involves depositing a gate oxide layer, polysilicon layer, and first metal layer, followed by etching to create gates in both regions. Doped regions are formed in the wells, and a silicide block layer is deposited over the photo-sensing region. The substrate is then exposed to a thermal environment to form silicide, and the second metal layer is removed by etching.
Career Highlights
Chunyun Xin is currently employed at Semiconductor Manufacturing International Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of CMOS image sensors, which are widely used in various applications, including digital cameras and smartphones.
Collaborations
Chunyun Xin has collaborated with notable colleagues such as Jianping Yang and Jieguang Huo. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.
Conclusion
Chunyun Xin's contributions to the field of CMOS image sensors exemplify his dedication to innovation and technology. His patent reflects a significant advancement in semiconductor manufacturing techniques. Through his work at Semiconductor Manufacturing International Corporation, he continues to influence the industry positively.