Kearny, NJ, United States of America

Chunmeng Lu


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2011-2012

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations of Chunmeng Lu in Aligned Nanostructured Polymers

Introduction

Chunmeng Lu is an accomplished inventor based in Kearny, NJ, with a focus on the synthesis of aligned nanostructured polymers. He holds two patents that showcase his innovative approaches in the field of materials science. His work has significant implications for various applications, particularly in electronics and nanotechnology.

Latest Patents

Chunmeng Lu's latest patents involve novel and simple methods for synthesizing aligned nanofibers of polyaniline and its substituted derivatives on a substrate. These methods allow for the production of these fibers by controlling the concentration of aniline monomer or substituted aniline derivatives, as well as an oxidant in the reaction medium. Notably, the concentration is maintained at levels much lower than those used in conventional polyaniline synthesis methods. Additionally, the patents disclose methods that utilize a permeable membrane to control the release of a monomer and/or oxidant, along with a bulk polymerization method.

Career Highlights

Chunmeng Lu is affiliated with The Ohio State University, where he contributes to research and development in the field of polymer science. His innovative work has garnered attention and recognition within the scientific community, further establishing his reputation as a leading inventor in his area of expertise.

Collaborations

Chunmeng Lu has collaborated with notable colleagues, including Arthur J Epstein and Nan-Rong Chiou. These partnerships have enhanced his research efforts and contributed to the advancement of knowledge in the field of aligned nanostructured polymers.

Conclusion

Chunmeng Lu's contributions to the field of aligned nanostructured polymers demonstrate his innovative spirit and commitment to advancing materials science. His patents reflect significant advancements that could lead to new applications and technologies in various industries.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…