Company Filing History:
Years Active: 1982-1984
Title: Innovations of Chunghsin Lee in Electron Beam Technology
Introduction
Chunghsin Lee is a notable inventor based in Reading, MA (US), recognized for his contributions to electron beam technology. With a total of 2 patents, he has made significant advancements in the field, particularly in applications related to semiconductor lithography.
Latest Patents
One of his latest patents is the "Laser stimulated high current density photoelectron generator and method." This invention discloses an electron beam generator specifically designed for direct-write semiconductor lithography applications. The device features a photoemissive cathode, a modulable laser for illuminating the cathode, and light optics to create an optical pattern on the cathode. The cathode is made of a light transmissive substrate coated with an optically semitransparent, electrically conductive film, which is further layered with a photoemissive substance like cesium antimonide. This configuration allows the cathode to emit a highly intense and monochromatic beam of electrons when illuminated by laser light. The emitted electron beam is shaped according to the optical pattern and is utilized in lithographically generating very large scale integrated (VLSI) circuits on semiconductors.
Another significant patent is the "Laser generated high electron density source." This apparatus is designed to generate high-density pulses of electrons thermionically. It includes a metallic target maintained within a low-pressure cesium vapor atmosphere. A laser rapidly heats the cesiated target surface to a high temperature in a time frame shorter than the residence time of cesium atoms adsorbed on the target surface. This rapid heating, combined with the adsorbed cesium atoms, results in the emission of copious quantities of electrons, forming a high current density pulse.
Career Highlights
Chunghsin Lee is currently associated with Thermo Electron Corporation, where he continues to innovate and develop technologies that enhance electron beam applications. His work has been pivotal in advancing the capabilities of semiconductor manufacturing processes.
Collaborations
Chunghsin has collaborated with notable professionals in his field, including Peter E Oettinger, contributing to the development of cutting-edge technologies in electron beam generation.
Conclusion
Chunghsin Lee's innovative work in electron beam technology has significantly impacted the semiconductor industry. His patents reflect a deep understanding of the complexities involved in electron generation and manipulation, paving