Company Filing History:
Years Active: 2013-2016
Title: Innovations of Chung-Yuan Liao
Introduction
Chung-Yuan Liao is a notable inventor based in Nantou County, Taiwan. He has made significant contributions to the field of technology, particularly in the development of advanced exposure apparatuses and methods for forming patterned layers. With a total of 3 patents to his name, Liao's work has had a considerable impact on the industry.
Latest Patents
Liao's latest patents include a "Method of forming patterned layer," a "Method of forming patterned photoresist layer," and an "Active device array substrate." The exposure apparatus described in his patents is designed to expose a photoresist layer on a substrate to create multiple strip exposed patterns. This apparatus features a light source, a lens group, and a mask. The lens group consists of several strip lenses arranged parallel to one another, with overlapping regions defined as lens connecting regions. The mask contains shielding patterns that correspond to the strip exposed patterns, each with strip openings aligned parallel to the shielding patterns.
Career Highlights
Chung-Yuan Liao is currently associated with AU Optronics Corporation, where he continues to innovate and develop new technologies. His expertise in the field has led to advancements that enhance the efficiency and effectiveness of exposure processes in various applications.
Collaborations
Liao has collaborated with several talented individuals, including Hsiang-Chih Hsiao and Ta-Wen Liao. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Chung-Yuan Liao's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in exposure apparatuses and methods, showcasing the importance of innovation in the industry.