Chung-Yu Liang

Title: Innovations of Chung-Yu Liang

Introduction

Chung-Yu Liang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative designs and patents. With a total of 2 patents, Liang continues to push the boundaries of what is possible in his field.

Latest Patents

Liang's latest patents include a dual-gate transistor and a pixel structure utilizing the same technology. The dual-gate transistor features a first gate formed on a substrate, with a first dielectric layer covering the gate and substrate. A semiconductor layer is formed on this dielectric layer, with first and second electrodes spaced apart to ensure separation. A second dielectric layer covers these electrodes, and a second gate is formed on top of it. Notably, at least one of the first and second gates does not overlap with the second electrode, showcasing an innovative approach to transistor design.

Career Highlights

Chung-Yu Liang is currently employed at AU Optronics Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the company's capabilities in producing high-quality display technologies.

Collaborations

Liang collaborates with talented coworkers such as Feng-Yuan Gan and Ting-Chang Chang, contributing to a dynamic team focused on innovation and excellence in their projects.

Conclusion

Chung-Yu Liang's contributions to the field of semiconductor technology through his patents and work at AU Optronics Corporation highlight his role as a leading inventor. His innovative designs continue to influence the industry and pave the way for future advancements.