Suwon, South Korea

Chung-Howan Kim


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Innovator Chung-Howan Kim: Pioneering Low-K Dielectric Technology

Introduction

Chung-Howan Kim is a distinguished inventor based in Suwon, South Korea, known for his significant contributions in the field of semiconductor technology. With one patented invention to his name, he has demonstrated a commitment to advancing innovation in the electronics industry.

Latest Patents

Chung-Howan Kim's notable patent is titled "Method of making intermetal dielectric layers having a low dielectric." This innovative method involves the formation of a low-k dielectric insulating layer, which plays a critical role in improving the performance of electronic devices. The technique encompasses the formation of a dielectric insulating layer followed by the removal of hydrogen bonds within the layer. Notably, the dielectric layer is preferably composed of a hybrid silsesquioxane (HSQ) film characterized by the Si--O--H structure. To eliminate hydrogen from the dielectric layer, he employs methods such as heat treatment in plasma, an ozone reduction process, ion implantation, or electron beam bombardment.

Career Highlights

Chung-Howan Kim is currently employed at Samsung Electronics Co., Ltd., a leading global technology company known for its innovative approaches in electronics and semiconductors. His work at Samsung has placed him at the forefront of technology development, showcasing his exceptional skills in research and invention.

Collaborations

Throughout his career, Chung-Howan Kim has collaborated with fellow innovators Ho Ko and Tae-ryong Kim. Together, these talented individuals contribute to the rich tapestry of innovation within their respective fields, pushing the boundaries of technology and design.

Conclusion

In summary, Chung-Howan Kim exemplifies the spirit of innovation through his groundbreaking work on low-k dielectric materials. His contributions not only enhance the capabilities of electronic devices but also set the stage for future advancements in semiconductor technology. As he continues his work at Samsung Electronics, the electronics industry eagerly anticipates the impact of his innovative endeavors.

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