Chung H Cheng

Title: Innovations by Chung H Cheng in Topical Delivery Systems

Introduction

Chung H Cheng is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of topical delivery systems, holding 2 patents that focus on innovative formulations for the controlled release of active ingredients.

Latest Patents

Cheng's latest patents include "Methods and compositions for topical delivery of retinoic acid" and "Methods and compositions for topical delivery of benzoyl peroxide." The first patent describes retinoic acid compositions intended for topical application, which are incorporated in novel formulations. These formulations retain the retinoic acid as impregnants inside the pores of porous solid particles or microspheres. The continuous network of pores allows for the outward diffusion of the retinoic acid at a controlled rate, depending on the pore size. The impregnated particles are prepared by impregnating preformed particles with the retinoic acid. The second patent outlines a similar approach for benzoyl peroxide, where it is also retained as impregnants within porous solid particles. This formulation permits controlled outward diffusion of benzoyl peroxide, enhancing its effectiveness for topical applications.

Career Highlights

Chung H Cheng is currently associated with Advanced Polymer Systems, Inc., where he continues to innovate in the field of polymer-based delivery systems. His work has significantly advanced the understanding and application of topical delivery methods.

Collaborations

Cheng has collaborated with notable colleagues such as Martin A Katz and Sergio Nacht, contributing to the development of advanced formulations and delivery systems.

Conclusion

Chung H Cheng's innovative work in topical delivery systems has led to significant advancements in the field, showcasing his expertise and commitment to improving therapeutic applications. His contributions continue to influence the development of effective topical treatments.