Chung-Bore Wang

Title: Innovations of Chung-Bore Wang

Introduction

Chung-Bore Wang is a notable inventor based in Fremont, California. He has made significant contributions to the field of optical systems, particularly with his innovative designs that enhance the functionality of photomasks.

Latest Patents

Wang holds a patent for a "Vent for an optical pellicle system." This invention provides an optical pellicle system that includes a frame with a top side and bottom side, a pellicle membrane covering the top side of the frame, and a photomask mounted to the bottom side of the frame. Additionally, the system features at least one venting slot defined in the photomask, extending under the frame from an area defined within the frame to an area outside of the frame. This design aims to improve the efficiency and effectiveness of optical pellicle systems.

Career Highlights

Chung-Bore Wang is currently associated with Micro Lithography Inc., where he applies his expertise in optical technologies. His work at the company has been instrumental in advancing the development of innovative lithography solutions.

Collaborations

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Conclusion

Chung-Bore Wang's contributions to optical pellicle systems exemplify the impact of innovative thinking in technology. His patent reflects a commitment to enhancing optical performance in lithography applications.