Hsinchu, Taiwan

Chung-An Hsieh


Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 98(Granted Patents)


Location History:

  • Hsinchu, TW (2008 - 2012)
  • Taipei, TW (2009 - 2018)

Company Filing History:


Years Active: 2008-2018

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6 patents (USPTO):Explore Patents

Title: Innovations of Chung-An Hsieh

Introduction

Chung-An Hsieh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of technology, particularly in the areas of profilometry and power amplification. With a total of six patents to his name, Hsieh's work reflects a commitment to advancing technological capabilities.

Latest Patents

One of Hsieh's latest patents is a measuring apparatus for three-dimensional profilometry and the method thereof. This invention provides a sophisticated approach to measuring the surface profile of an object by utilizing a random-speckle beam and a structured fringe beam. The method involves projecting these beams onto the object, capturing the reflected images, and processing them to obtain absolute and relative phase information. This information is then converted into depth data, allowing for a detailed surface profile to be established. Another significant patent is for a power amplifier and processing device that includes a control unit generating multiple control signals. These signals manage a series of switches within the power amplifier to prevent short through currents, enhancing the device's efficiency and reliability.

Career Highlights

Chung-An Hsieh has worked with prominent companies in the semiconductor industry, including Anpec Electronics Corporation and Upi Semiconductor Corporation. His experience in these organizations has contributed to his expertise and innovation in the field.

Collaborations

Hsieh has collaborated with notable colleagues such as Fu-Yuan Chen and Yueh-Ping Yu. Their combined efforts have likely fostered advancements in their respective projects and innovations.

Conclusion

Chung-An Hsieh's contributions to technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in profilometry and power amplification.

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