Portland, OR, United States of America

Chun-Hao Chen


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Chun-Hao Chen in Reaction Chamber Processing

Introduction

Chun-Hao Chen is an accomplished inventor based in Portland, OR (US). He has made significant contributions to the field of processing methods and apparatus, particularly in improving throughput in reaction chambers. His innovative approach has led to the development of a unique patent that addresses critical challenges in the deposition of substrates.

Latest Patents

Chun-Hao Chen holds a patent titled "Throughput improvement with interval conditioning purging - Processing methods and apparatus for increasing a reaction chamber batch size." This patent describes a method for processing deposition substrates, such as wafers. The process involves conducting a deposition on a first portion of a batch of wafers in a reaction chamber, followed by an interval conditioning purge to eliminate defects generated during wafer processing. After this purge, deposition continues on another portion of the batch. This innovative method ensures that the purge occurs before exceeding a baseline for acceptable defect generation, enhancing the overall efficiency of the reaction chamber.

Career Highlights

Chun-Hao Chen is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on advancing technologies that improve manufacturing processes for semiconductor devices. With a patent portfolio that includes 1 patent, he has established himself as a key contributor to the field.

Collaborations

Chun-Hao Chen has collaborated with notable colleagues, including Jeremy David Fields and Frank Loren Pasquale. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Chun-Hao Chen's contributions to the field of reaction chamber processing exemplify the impact of innovative thinking in technology. His patent not only addresses existing challenges but also paves the way for future advancements in semiconductor manufacturing.

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