Company Filing History:
Years Active: 2022
Title: Innovations by Chuan-Wei Kuo in Wafer Drying Technology.
Introduction
Chuan-Wei Kuo is an accomplished inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly in the area of wafer drying technology. His innovative methods aim to improve efficiency and effectiveness in the manufacturing process.
Latest Patents
Chuan-Wei Kuo holds a patent for a "Method for drying wafer at room temperature." This method involves a multi-step process that includes cleaning, reacting, and pressure releasing steps. The cleaning step requires placing a processing workpiece into a cleaning solvent. The reacting step involves introducing a supercritical fluid into a reaction chamber, where the pressure is increased to dissolve the cleaning solvent in the supercritical fluid. Notably, the critical temperature of the supercritical fluid is below room temperature. Finally, the pressure releasing step entails discharging the supercritical fluid along with the cleaning solvent from the reaction chamber after complete dissolution.
Career Highlights
Chuan-Wei Kuo is affiliated with the National Sun Yat-sen University of Kaohsiung, where he contributes to research and development in semiconductor technologies. His work has garnered attention for its potential to enhance wafer processing techniques.
Collaborations
Chuan-Wei Kuo collaborates with notable colleagues such as Ting-Chang Chang and Chih-Cheng Yang. Their combined expertise fosters innovation and advances research in their respective fields.
Conclusion
Chuan-Wei Kuo's contributions to wafer drying technology exemplify the importance of innovation in semiconductor manufacturing. His patented method showcases a significant advancement that could lead to more efficient production processes.