Hsinchu, Taiwan

Chuan-Kai Lo


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: Innovations by Inventor Chuan-Kai Lo in Semiconductor Etching Processes

Introduction

Chuan-Kai Lo is a notable inventor based in Hsinchu, Taiwan, recognized for his contributions to semiconductor technology. With a portfolio of two patents, Lo has made significant strides in improving etching processes, which are crucial for the manufacturing of integrated circuits.

Latest Patents

Lo's most recent patents highlight innovative methods in semiconductor dual damascene etching. One of his patents presents a comprehensive dual damascene oxide etch process that integrates all necessary steps into a confined plasma chamber. This invention features a confinement ring and an anti-etching upper electrode plate, which collectively enhance process efficiency while significantly reducing manufacturing costs and time.

His other patent addresses selective etching in low-pressure, high-density plasma conditions. It achieves remarkable selectivity between oxide and photoresist in the etching of high-aspect-ratio openings. This method not only improves polymer deposition control but also prevents etch stopping, allowing for refined etching in complex geometries within semiconductor devices.

Career Highlights

Chuan-Kai Lo currently contributes his expertise to Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His innovative work within the organization underlines his commitment to advancing semiconductor technology and process optimization.

Collaborations

Throughout his career, Lo has collaborated with fellow experts such as Chok Ho and Fang-Ju Lin. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and technological advancements in the semiconductor field.

Conclusion

Chuan-Kai Lo continues to make significant impacts within the semiconductor industry through his innovative patents and collaborative efforts. His developments in etching processes not only streamline production but also reduce costs, positioning him as a valuable contributor to the advancement of semiconductor manufacturing technologies.

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