Taichung, Taiwan

Chu-Chieh Lin


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 65(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):

Title: Innovations by Chu-Chieh Lin in Nanoscale Microstructures

Introduction

Chu-Chieh Lin is a notable inventor based in Taichung, Taiwan. He has contributed to the field of materials science with a focus on nanoscale structures. His innovative approach has led to the development of unique methods for creating sophisticated microstructures that hold promise for various applications.

Latest Patents

Chu-Chieh Lin holds a patent for "Nanoscale helical microstructures and channels from chiral poly(L-lactide) block containing block copolymers." This invention involves a method for generating nanoscale microstructures, including helical microstructures and cylindrical microstructures. The process comprises two critical steps: first, forming a chiral block copolymer with specific volume fractions, and second, inducing phase separation within the copolymer. In particular, he has utilized the poly(styrene)-poly(L-lactide) chiral block copolymer, along with a living copolymerization process. Notably, his research indicates that with an optimal volume fraction of poly(L-lactide) around 35–37%, nanoscale helices featuring a pitch of 43.8 nanometers and a diameter of 34.4 nanometers can be observed through transmission electron microscopy (TEM) and small-angle X-ray scattering (SAXS).

Career Highlights

Chu-Chieh Lin is associated with the Industrial Technology Research Institute, where he has embarked on significant research initiatives in material engineering and polymer science. His innovative work not only contributes to academic knowledge but also opens pathways for practical applications in technology and industry.

Collaborations

Throughout his career, Lin has collaborated with eminent coworkers such as Rong-Ming Ho and Yeo-Wan Chiang. These professional partnerships have fostered a rich exchange of ideas and enhanced the research output, thereby contributing to advancements in the creation of novel nanoscale microstructures.

Conclusion

In summary, Chu-Chieh Lin's contributions to the field of nanoscale microstructures exemplify the spirit of innovation in contemporary science. His patent reflects a significant advancement in materials engineering, which has the potential to influence various sectors by providing intricate microstructural designs. Lin's work, along with his collaborations, underscores the importance of teamwork in driving forward the boundaries of knowledge and innovation in materials science.

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