Chapel Hill, NC, United States of America

Christopher R Needes



Average Co-Inventor Count = 1.9

ph-index = 6

Forward Citations = 152(Granted Patents)


Location History:

  • Newark, DE (US) (1978 - 1981)
  • Chapel Hill, NC (US) (1998 - 2010)

Company Filing History:


Years Active: 1978-2010

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14 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Christopher R Needes

Introduction

Christopher R Needes is a prominent inventor based in Chapel Hill, NC (US). He has made significant contributions to the field of engineering, particularly in the development of advanced materials for electronic applications. With a total of 14 patents to his name, Needes has established himself as a key figure in innovation.

Latest Patents

Among his latest patents, Needes has developed thick film conductor case compositions for low-temperature co-fired ceramic (LTCC) applications. His inventions include methods for forming multilayer circuits using a thick film paste composition. This composition consists of a mixture of lead iron tungstate niobate solid solutions, barium titanate, lead oxide, and fused silica, among other materials. These innovations are crucial for the formation of multilayer circuits that enhance the performance of electronic devices.

Career Highlights

Throughout his career, Christopher R Needes has worked with notable companies such as E.I. DuPont de Nemours and Company and Delco Electronics Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the field of electronics.

Collaborations

Needes has collaborated with several talented individuals in his field, including Carl Baasun Wang and Kenneth Warren Hang. These partnerships have fostered a creative environment that has led to the development of innovative technologies.

Conclusion

Christopher R Needes is a distinguished inventor whose work has significantly impacted the field of electronics. His numerous patents and collaborations highlight his dedication to innovation and advancement in technology.

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