Hastings, MN, United States of America

Christopher N Loesch


Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 2007-2015

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2 patents (USPTO):Explore Patents

Title: The Innovations of Christopher N. Loesch: Advancements in Polishing Technology

Introduction

Christopher N. Loesch, an inventive mind located in Hastings, Minnesota, has made significant contributions to the polishing technology field through his innovative patents. With a total of two patents to his name, he has demonstrated a commitment to enhancing processes in the chemical mechanical planarization (CMP) applications.

Latest Patents

His latest patents reveal a strong focus on polishing pads that utilize a phase-separated polymer blend. The first patent details "Polishing pads including phase-separated polymer blend and method of making and using the same." This patent describes polishing pads that consist of various polishing elements that can be integrally formed in a sheet or bonded to a support layer using methods like thermal bonding. Some embodiments also include a compliant layer affixed to the support layer, ensuring optimized polishing performance.

The second patent, "Pad constructions for chemical mechanical planarization applications," showcases his work on an abrasive article comprising a fixed abrasive layer and a resilient subpad, designed with a Shore A hardness of no greater than 60, as per ASTM-2240 standards. These innovations enhance the efficacy and efficiency of the polishing process in various applications.

Career Highlights

Christopher is currently associated with 3M Innovative Properties Company, where he leverages his expertise in materials science and engineering to contribute to cutting-edge technological advancements. His work with this renowned company underscores his role in developing innovative solutions that cater to modern polishing needs.

Collaborations

Throughout his career, Christopher has collaborated with notable colleagues such as William D. Joseph and Gary M. Palmgren. These partnerships have contributed to the rich exchange of ideas and the development of groundbreaking polishing technologies.

Conclusion

Christopher N. Loesch's inventive spirit and dedication to improving polishing pads are evident in his patents and work at 3M Innovative Properties Company. As he continues to innovate, his contributions will likely lead to further advancements in the field, showcasing the importance of ingenuity in the ever-evolving world of technological innovation.

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