Newport, United Kingdom

Christopher Jonathan W Bolton


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Christopher Jonathan W Bolton

Introduction

Christopher Jonathan W Bolton is a notable inventor based in Newport, GB. He has made significant contributions to the field of semiconductor technology, particularly in the area of surface processing. His innovative approach has led to the development of a unique method for reducing surface roughness on silicon substrates.

Latest Patents

Bolton holds a patent for a method of reducing surface roughness on a non-planar surface of a silicon substrate with upstanding and/or recessed features. This patent outlines a first sequence of plasma processing steps and a second sequence of plasma processing steps that can be performed on the silicon substrate to effectively reduce surface roughness while retaining the essential features. The first sequence includes a plasma deposition step using oxygen and at least one fluorocarbon gas, followed by a plasma etch step using oxygen, at least one fluorocarbon etchant gas, and SF. The second sequence consists of an isotropic plasma etch step using oxygen and at least one fluorine-containing etchant gas, followed by a plasma etch step using at least one fluorine-containing or chlorine-containing etchant gas. This innovative method has the potential to enhance the quality of semiconductor devices.

Career Highlights

Bolton is currently associated with SPTS Technologies Limited, where he continues to push the boundaries of semiconductor processing technology. His work has been instrumental in advancing the capabilities of silicon substrates, making them more efficient for various applications.

Collaborations

One of his notable collaborators is Roland Mumford, with whom he has worked closely to develop and refine his innovative techniques in surface processing.

Conclusion

Christopher Jonathan W Bolton's contributions to the field of semiconductor technology are noteworthy. His patented method for reducing surface roughness on silicon substrates showcases his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future innovations.

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