Christopher J Ashton

Title: Christopher J Ashton: Innovator in Electron Beam Lithography

Introduction

Christopher J Ashton, an accomplished inventor based in Harrison, NY, has made a significant contribution to the field of electron beam lithography. His innovative methods address critical challenges in this advanced technology area, particularly in the correction of proximity effects that can significantly impact the outcomes of lithographic processes.

Latest Patents

Christopher J Ashton holds a patent for a method designed to correct proximity effects in electron beam lithography. This inventive process is tailored for high voltages and dense patterns, and it utilizes both backscatter and forward scatter dose corrections. The approach involves the computation of two matrices: a 'Proximity Matrix' (P) and a 'Fractional Density Matrix' (F). The Proximity Matrix is generated using established algorithms, while the elements of the Fractional Density Matrix describe the fractional shape coverage in a mesh overlaying the pattern of interest. Subsequently, a Dose Correction Matrix (D) is developed by convolving the P and F matrices, allowing for optimized dose corrections tailored to each shape through either area-weighted averages or interpolation. This method also incorporates optional forward scattering corrections to further enhance accuracy.

Career Highlights

Christopher is presently affiliated with the International Business Machines Corporation, commonly known as IBM, where his work continues to influence advancements in semiconductor manufacturing technologies. His single patent stands as a testament to his expertise and innovation in the field, underlining his role in pushing the boundaries of what is possible in electron beam lithography.

Collaborations

Throughout his career, Christopher has worked alongside notable colleagues, including Porter Dean Gerber and Dieter P Kern. His collaborations demonstrate the collaborative spirit of innovation within the technological community, as they collectively contribute to advancements that shape modern manufacturing processes.

Conclusion

Christopher J Ashton represents the spirit of innovation in the field of electron beam lithography. His patented method for correcting proximity effects not only addresses contemporary challenges but also paves the way for future developments in lithographic techniques. As technology continues to evolve, contributions from inventors like Ashton will remain critical to ongoing advancements in various engineering disciplines.