Christopher H Olson

Title: An Insight into the Innovations of Christopher H. Olson

Introduction

Christopher H. Olson, an accomplished inventor based in El Dorado, CA, has made significant contributions to the field of plasma processing technology. With a total of four patents to his name, Olson has developed innovative methods and devices that enhance the efficiency and effectiveness of plasma processing systems.

Latest Patents

Olson's latest patents include groundbreaking work in the area of wafer processing:

1. **Method and Device for Compensating Wafer Bias in a Plasma Processing Chamber** - This patent discloses a novel method and device designed to compensate for bias voltage on a wafer situated above an electrostatic chuck within a processing chamber. The system incorporates electrostatic and RF power supplies linked to the electrostatic chuck, featuring a voltage converter, storage unit, and voltage adjusting circuitry. The voltage converter detects and converts the voltage from the electrostatic chuck, ensuring that the wafer bias voltages are accurately calibrated based on a predetermined slope and offset derived from a calibration curve.

2. **Plasma Processing Method and Apparatus with Control of RF Bias** - In this innovation, Olson addresses the challenge of power reflected back to an RF bias source in a vacuum plasma processor. By controlling the RF bias source output power, he ensures that the power delivered to the plasma within the vacuum processing chamber remains constant. This is achieved by adjusting the RF bias source output power rapidly compared to the changes in capacitors of a matching network connected to the electrode of the workpiece holder processor, while determining the plasma's capacitive impedance through optical measurements of the plasma sheath thickness.

Career Highlights

Christopher H. Olson is associated with Lam Research Corporation, a leading provider of wafer fabrication equipment and services to the semiconductor industry. His work has not only advanced his career but also significantly contributed to the technological developments within the company.

Collaborations

In his journey as an inventor, Olson has collaborated with notable colleagues, including Farro Frank Kaveh and Michael S. Barnes. Their collective efforts exemplify the synergy that exists within the research environment at Lam Research Corporation, fostering innovation and driving advancements in plasma processing technology.

Conclusion

Christopher H. Olson continues to impact the field of plasma processing through his innovative patents and collaborations. His dedication to developing cutting-edge solutions exemplifies the spirit of innovation within the technology sector, paving the way for future advancements in semiconductor manufacturing.