Pigman, France

Christopher François Lilian Pomarède


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 75(Granted Patents)


Company Filing History:


Years Active: 2001

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: **Innovator Profile: Christopher François Lilian Pomarède**

Introduction

Christopher François Lilian Pomarède is a notable inventor based in Pigman, France. With one patented invention to his name, he has made significant contributions to the field of silicon deposition methods. His work is particularly relevant in industries that require advanced semiconductor manufacturing techniques.

Latest Patents

Pomarède's patent, titled "Method of Depositing Silicon with High Step Coverage," presents a unique method for achieving high deposition rates and good step coverage of silicon. The process is conducted at high pressures, close to atmospheric levels, and at temperatures exceeding 650°C. This innovative approach involves the flow of silane and hydrogen over a substrate within a single-wafer chamber. Notably, the technique allows for high deposition rates, exceeding 50 nm/min, while maintaining sufficient step coverage to fill deep trenches and vias with high aspect ratios, reaching up to 40:1. This invention holds great promise for the commercial production of conductive silicon without the risk of voids or keyholes.

Career Highlights

Pomarède is currently associated with Asm America, Inc., where he continues to contribute to advancements in semiconductor technologies. His expertise and innovative mindset have positioned him as a key figure in the field.

Collaborations

Throughout his career, Pomarède has collaborated with notable colleagues including Ivo Johannes Raaijmakers and Cornelius Alexander van der Jengd. These partnerships are integral to his research and development efforts, enhancing the scope and impact of his work in semiconductor innovations.

Conclusion

Christopher François Lilian Pomarède's contributions to the method of depositing silicon with high step coverage signify an important advancement in semiconductor manufacturing. His innovative techniques not only streamline the production process but also enhance the reliability of silicon deposition necessary for modern electronics. As he continues his work at Asm America, Inc., Pomarède remains a vital contributor to the evolving landscape of technology and innovation.

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