Osterode, Germany

Christopher D Simpson

USPTO Granted Patents = 19 

 

Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2010-2025

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19 patents (USPTO):Explore Patents

Title: Christopher D. Simpson: Innovator in Lithographic Printing Technology

Introduction

Christopher D. Simpson is a notable inventor based in Osterode, Germany. He has made significant contributions to the field of lithographic printing, holding a total of 19 patents. His work focuses on developing advanced printing plate precursors that enhance the quality and stability of print images.

Latest Patents

One of his latest patents is for an IR-sensitive lithographic printing plate precursor and method of use. This innovation provides a stable print-out image using a unique IR radiation-sensitive composition in an infrared radiation-sensitive image-recording layer. The composition includes a free radical initiator that comprises an electron-donating agent, a free radically polymerizable composition, and a color-changing compound with a conjugated carbon chain between aromatic terminal groups. After IR imaging, these precursors exhibit desirable printout images both fresh and after dark storage. The precursors can be developed off-press or on-press, showcasing their versatility in the printing process.

Career Highlights

Throughout his career, Christopher has worked with prominent companies, including Eastman Kodak Company. His experience in the industry has allowed him to refine his inventions and contribute to advancements in printing technology.

Collaborations

Christopher has collaborated with notable professionals in his field, including Harald Baumann and Udo Dwars. These partnerships have further enriched his work and led to innovative solutions in lithographic printing.

Conclusion

Christopher D. Simpson is a distinguished inventor whose contributions to lithographic printing technology have made a lasting impact. His innovative patents and collaborations reflect his commitment to advancing the field.

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