Christopher Adam Feild

Title: The Innovative Mind of Christopher Adam Feild

Introduction

Christopher Adam Feild is a prominent inventor based in Yorktown Heights, NY, with a remarkable portfolio of five patents. His contributions to the field of photolithography and interconnect technology have had significant implications in various industries, showcasing his innovative spirit and technical prowess.

Latest Patents

Feild's latest patents exemplify his ingenuity in addressing critical challenges in chip manufacturing. One notable patent is titled "Method to Overcome Image Shortening by Use of Sub-Resolution Reticle Features." This invention focuses on substantially reducing image shortening in photolithographic processes by implementing sub-resolution reticle features that adjust the aerial image in affected areas. The simplicity of this method makes it an attractive solution for design systems, enhancing feature aspect ratios and allowing for better integration with other critical features.

Another significant contribution is his patent for a "Dual-RIE Structure for Via/Line Interconnections." This innovative structure involves a reactive ion etching (RIE) process to define a via/interconnect structure. The methodology described in this patent highlights the formation of vias prior to interconnects, addressing electromigration performance with exceptional interfacial integrity through a single-step process using lithography and RIE.

Career Highlights

Throughout his career, Christopher Feild has worked with esteemed companies that have allowed him to hone his skills and amplify his impact in the field. Notably, he has been associated with International Business Machines Corporation (IBM) and Intermec IP Corporation, where he contributed to cutting-edge research and development.

Collaborations

Feild has collaborated with notable colleagues including Dah-Weih Duan and Michael John Brady. These collaborations undoubtedly enriched his work experience and further fueled his motivation to innovate.

Conclusion

Christopher Adam Feild stands out in the realm of inventions and technology development. His innovative patents not only push the boundaries of what's possible in photolithography and interconnect technologies but also set a benchmark for future research. His contributions continue to be invaluable assets to the tech industry, reflecting his dedication to advancing technology through innovation.