München, Germany

Christoph Friedrich


 

Average Co-Inventor Count = 4.8

ph-index = 4

Forward Citations = 63(Granted Patents)


Location History:

  • Munich, DE (2003)
  • München, DE (2002 - 2004)

Company Filing History:


Years Active: 2002-2004

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5 patents (USPTO):

Title: Christoph Friedrich: Innovator in Lithography Technology

Introduction

Christoph Friedrich, located in München, Germany, is a notable inventor with a focus on advancements in lithography technology. With a record of five patents, he has made significant contributions to the field, particularly in the development and fabrication of integrated circuits. His work exemplifies the intersection of innovation and practical application in modern technology.

Latest Patents

Among Christoph Friedrich's latest patents, his work on "Lithography Method and Lithography Mask" stands out. This invention involves a process where layers are patterned through a lithography method during the fabrication of integrated circuits. It features a mask, either reflective or transmissive, that facilitates this method by guiding extreme ultraviolet radiation onto photosensitive layers.

Another significant patent is the "Alternating Phase Mask," which describes a branched structure featuring opaque segments alongside transparent surface segments equipped with phases that are precisely displaced by 180 degrees plus or minus a small margin. This innovative design aims to enhance the effectiveness of lithography techniques in semiconductor manufacturing.

Career Highlights

Christoph Friedrich has honed his expertise while working with esteemed companies, including Infineon Technologies AG and Siemens Aktiengesellschaft. His tenure at these organizations has allowed him to contribute to cutting-edge research and development in the realms of microelectronics and circuit fabrication.

Collaborations

Throughout his career, Christoph has collaborated with distinguished colleagues, including Uwe Griesinger and Rainer Pforr. These collaborations have fostered an environment that encourages innovative thinking and the mutual sharing of ideas, leading to significant advancements in lithography technology.

Conclusion

In conclusion, Christoph Friedrich’s work exemplifies a strong commitment to innovation in the lithography sector. His patents not only illustrate his inventiveness but also contribute to the broader field of integrated circuit fabrication. As technology continues to evolve, his contributions will undoubtedly play a crucial role in shaping future advancements.

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